Characterization and Fabrication of Multilayersof A1xGal_xAs/GaAs by Epitaxy
Five layers of GaAs:Te(n=2x 1018 cmchr('39') Alo.4GaQ.6As:Sn(n=5xWI6 em,3}. GaAs, Alo .• GaQ.6As: Ge(p=3xW17 em-3),GaM: GC(p= IXlO18cm 3) were grown by supercooled LiquidPhase Epilaxy on n-GaAs(IOO) substrate. The cooling rate of thefurnace was SCI up With U. I"C/min al T=860°C. The firSI layerwas grown at T=840°C and Ihe la sl one at T=827°C. Thethi ckness were varied between 0.1 10 8,um by controlling thesupercooling IcmperalUre and growth time. Quality and quantilYof epitaxial layers were examined by TEM, SEM, PIXE and x-ray,
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