Effect of Different Surface Morphology on Growth of Nanocrystalline Diamond by HFCVD

Carbon is one of the most important element in Periodic Table which consist of several allotropes. Among various allotropes of carbon, Diamond is one of the remarkable one because of its outstanding properties which attracts many researchers. There is various method for diamond production that Hot filament Chemical Vapor Deposition (HFCVD) is most commercial due to its low cost and high production ratio in comparison with other methods. In this paper, the effect of surface morphology variance and treatment methods on surface roughness were investigated. The substrate was polished with Diamond paste and polishing system. The roughness of the substrates was analyzed with Atomic Force Microscopy (AFM). The result of the optimum Al substrate was compared with Si-Au substrate as a reference. A combination of CH4/H2 with 5% flow ratio and 300 sccm flow ratio for 60 minutes was fed into the reaction chamber. The result of the X-ray diffraction method (XRD) illustrated the high intensity and high-quality diamond production was obtained with decreasing the Aluminum surface roughness. The results show that the quality of the diamond in Al substrate with 11.37nm average roughness is better than silicon coated gold as a reference.