An innovative method for estimating optimal Gate work function and dielectric constant of a nanoscale DG-TFET based on analytical modeling of tunneling length in ambipolar Off and ON states

In this paper, we propose an innovative and low computational cost approachthat can be used to find optimal values of parameters of a nanoscale dual-gatea tunneling field-effect transistor (DG-TFET). In this way, after obtaining analyticalexpressions for potential and energy bands of the device using the Poissonequation, the tunneling length is extracted at source-channel and channel-draintunnel junctions in the AMBIPOLAR, Off and On states. Due to the tunnelinglength equation, the different values of gate work function and dielectric constantof the device are swept to determine the minimum and maximum designlimits. According to the above range, the necessary checks are made to reachthe local optimal behaviors. These optimum points are explained based on theachievement of optimal device performance. The accuracy and consistency of theproposed model are validated with the TCAD simulation results. The present modelcan be a handful for the study of TFET performance.